DocumentCode
2992274
Title
Application of Focus Ion Beam Circuit Edit in Failure Analysis
Author
Loh, S.K. ; Teo, H.T. ; Neo, S.P. ; Song, Z.G. ; Oh, C.K.
Author_Institution
Chartered Semicond. Mfg Ltd., Singapore
fYear
2006
fDate
Oct. 29 2006-Dec. 1 2006
Firstpage
634
Lastpage
636
Abstract
Focus ion beam is an indispensable tool in failure analysis laboratory. It has a wide range of applications. This paper will discuss its application in circuit edit to enhance failure analysis on two failure modes by isolating the defective sites of the failures and finally identifying the root causes.
Keywords
circuit reliability; failure analysis; focused ion beam technology; network analysis; defective site isolation; failure analysis laboratory; focus ion beam circuit edit; Circuits; Failure analysis; Ion beams; Laboratories; MIM capacitors; Random access memory; Silicidation; Voltage; Wires; Wood industry;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Electronics, 2006. ICSE '06. IEEE International Conference on
Conference_Location
Kuala Lumpur
Print_ISBN
0-7803-9730-4
Electronic_ISBN
0-7803-9731-2
Type
conf
DOI
10.1109/SMELEC.2006.380710
Filename
4266693
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