DocumentCode :
2992601
Title :
Failure Analysis of A Unique Poly Defect
Author :
Neo, S.P. ; Song, Z.G. ; Oh, C.K. ; Zhao, S.P.
Author_Institution :
Chartered Semicond. Manuf. Ltd., Singapore
fYear :
2006
fDate :
Oct. 29 2006-Dec. 1 2006
Firstpage :
696
Lastpage :
698
Abstract :
To successfully identify the root cause of a failure, it is required to have systematic failure analysis approaches with the right techniques and to make detailed observation during the course of analysis. In this paper, detailed failure analysis has been present to identify the root cause of a unique poly defect through taking the right approaches and techniques.
Keywords :
failure analysis; semiconductor devices; semiconductor devices; systematic failure analysis; unique poly defect identification; Etching; Failure analysis; Feedback; Manufacturing processes; Oxidation; Performance analysis; Semiconductor devices; Silicon compounds; Tungsten; Wood industry;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Electronics, 2006. ICSE '06. IEEE International Conference on
Conference_Location :
Kuala Lumpur
Print_ISBN :
0-7803-9730-4
Electronic_ISBN :
0-7803-9731-2
Type :
conf
DOI :
10.1109/SMELEC.2006.380725
Filename :
4266708
Link To Document :
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