Title :
The challenges in automotive Low-k fine pitch bonding
Author :
Ibrahim, Roliana ; Au Yin Kheng ; Yong Cheng Choi
Author_Institution :
R & D Center, Freescale Semicond. (M) Sdn. Bhd., Petaling Jaya, Malaysia
Abstract :
Gold ball bonding remains to be the key technology in the assembly of semiconductor packaging. In response to the demand for higher I/O´s and increased package functionality, the bond pad pitch (BPP) and bond pad opening (BPO) will subsequently decrease. This technology trend demands the use of finer wire diameters and provide good wire bonding process. However, wire bond reliability continues to be the most challenging area with ever finer pitch devices, particularly to meet automotive requirement. Non-stick on pad (NSOP) and insufficient intermetallic coverage (IMC) due to either wafer surface contaminants, wire bond process and material set are still the main issue in Low-K wire bonding technology. Decapsulation and wire pull after temperature cycling is another challenge that needs in depth focus. This paper specifically discusses various phenomenons of bondability, wafer variation and reliability issue towards meeting the automotive reliability requirements. Failure analysis results are also briefly discussed.
Keywords :
assembling; failure analysis; lead bonding; semiconductor device packaging; semiconductor device reliability; automotive low-k fine pitch bonding; bond pad opening; bond pad pitch; decapsulation; failure analysis; fine pitch devices; gold ball bonding; low-k wire bonding technology; nonstick on pad; semiconductor assembly packaging; temperature cycling; wafer surface contaminants; wire bonding process reliability; Assembly; Automotive engineering; Bonding processes; Gold; Intermetallic; Semiconductor device packaging; Surface contamination; Temperature; Wafer bonding; Wire;
Conference_Titel :
Electronic Manufacturing Technology Symposium (IEMT), 2008 33rd IEEE/CPMT International
Conference_Location :
Penang
Print_ISBN :
978-1-4244-3392-6
Electronic_ISBN :
1089-8190
DOI :
10.1109/IEMT.2008.5507820