DocumentCode :
2993075
Title :
A Study on Minority Carrier Diffusion Length of Semiconductor with Constant Measure of Surface Photovoltage
Author :
He, Xuan ; Chen, Changying ; Deng, Wei ; Zhang, Hao
Author_Institution :
Educ. Dept. of Guangdong Province, Jinan Univ., Guangzhou, China
fYear :
2012
fDate :
21-23 May 2012
Firstpage :
1
Lastpage :
3
Abstract :
To evaluate the quality of silicon, based on the integrity of materials, a system using surface photovoltage to measure the minority carrier diffusion length of semiconductor. The system can be used to obtain the surface photovoltage by the method of chopper, monochromator and Lock-in amplifier. We get the minority carrier diffusion length of semiconductor by the use of the relationship between the surface photovoltage and the optical absorption coefficient of materials. The measuring principle of the system and the realizing methods for all models are explained in detail. The results showed that a constant measure of surface photovoltage method for measuring the semiconductor minority carrier diffusion length to achieve the intended results.
Keywords :
absorption coefficients; carrier lifetime; elemental semiconductors; minority carriers; silicon; surface photovoltage; Si; chopper method; lock-in amplifier; monochromator; optical absorption coefficient; semiconductor minority carrier diffusion length; surface photovoltage; Charge carrier lifetime; Frequency measurement; Length measurement; Optical surface waves; Pollution measurement; Semiconductor device measurement; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photonics and Optoelectronics (SOPO), 2012 Symposium on
Conference_Location :
Shanghai
ISSN :
2156-8464
Print_ISBN :
978-1-4577-0909-8
Type :
conf
DOI :
10.1109/SOPO.2012.6270463
Filename :
6270463
Link To Document :
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