DocumentCode
2997495
Title
A high speed subthreshold SRAM cell design
Author
Ahmadimehr, Amir-Reza ; Ebrahimi, Behzad ; Afzali-Kusha, Ali
Author_Institution
Nanoelectron. Center of Excellence, Univ. of Tehran, Tehran, Iran
fYear
2009
fDate
15-16 July 2009
Firstpage
9
Lastpage
13
Abstract
In this paper, we propose a subthreshold SRAM cell structure which can be read differentially. The main advantage of the cell is its high read current while the static noise margin and power consumption are reasonable. The cell is suitable for high performance applications where the speed is of prime concern. To assess the efficiency of the proposed cell, we compare its characteristics to three subthreshold SRAM cell structures recently introduced in the literature. The cells are implemented in both the bulk and SOI-FinFET technologies at the node of 32 nm.
Keywords
MOSFET; SRAM chips; high-speed integrated circuits; integrated circuit design; nanoelectronics; silicon-on-insulator; SOI-FinFET technology; bulk FinFET technology; high speed subthreshold SRAM cell design; power consumption; size 32 nm; static noise margin; Design engineering; Digital circuits; Energy consumption; FinFETs; Nanoelectronics; Power engineering and energy; Power engineering computing; Random access memory; Robustness; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Quality Electronic Design, 2009. ASQED 2009. 1st Asia Symposium on
Conference_Location
Kuala Lumpur
Print_ISBN
978-1-4244-4952-1
Electronic_ISBN
978-1-4244-4952-1
Type
conf
DOI
10.1109/ASQED.2009.5206306
Filename
5206306
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