• DocumentCode
    2997495
  • Title

    A high speed subthreshold SRAM cell design

  • Author

    Ahmadimehr, Amir-Reza ; Ebrahimi, Behzad ; Afzali-Kusha, Ali

  • Author_Institution
    Nanoelectron. Center of Excellence, Univ. of Tehran, Tehran, Iran
  • fYear
    2009
  • fDate
    15-16 July 2009
  • Firstpage
    9
  • Lastpage
    13
  • Abstract
    In this paper, we propose a subthreshold SRAM cell structure which can be read differentially. The main advantage of the cell is its high read current while the static noise margin and power consumption are reasonable. The cell is suitable for high performance applications where the speed is of prime concern. To assess the efficiency of the proposed cell, we compare its characteristics to three subthreshold SRAM cell structures recently introduced in the literature. The cells are implemented in both the bulk and SOI-FinFET technologies at the node of 32 nm.
  • Keywords
    MOSFET; SRAM chips; high-speed integrated circuits; integrated circuit design; nanoelectronics; silicon-on-insulator; SOI-FinFET technology; bulk FinFET technology; high speed subthreshold SRAM cell design; power consumption; size 32 nm; static noise margin; Design engineering; Digital circuits; Energy consumption; FinFETs; Nanoelectronics; Power engineering and energy; Power engineering computing; Random access memory; Robustness; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quality Electronic Design, 2009. ASQED 2009. 1st Asia Symposium on
  • Conference_Location
    Kuala Lumpur
  • Print_ISBN
    978-1-4244-4952-1
  • Electronic_ISBN
    978-1-4244-4952-1
  • Type

    conf

  • DOI
    10.1109/ASQED.2009.5206306
  • Filename
    5206306