DocumentCode :
3000963
Title :
A comprehensive trapped charge profiling technique for SONOS flash EEPROMs
Author :
Nair, Pradeep R. ; Kumar, P. Bharath ; Sharma, Ravinder ; Mahapatra, S. ; Kamohara, S.
Author_Institution :
Dept. of Electr. Eng., Indian Inst. of Technol., Bombay, India
fYear :
2004
fDate :
13-15 Dec. 2004
Firstpage :
403
Lastpage :
406
Abstract :
Trapped charge profiles under CHE program of SONOS flash cells are uniquely determined and verified using I-V, GIDL and CP measurements and Monte Carlo simulations. The prospect of profiling using I-V measurement alone is discussed. The inaccuracy associated with conventional CP technique is discussed. The correct method of CP simulation for programmed SONOS devices is shown and programming induced interface-trap generation is estimated.
Keywords :
Monte Carlo methods; circuit simulation; flash memories; integrated circuit measurement; interface states; semiconductor-insulator-semiconductor structures; CP measurements; GIDL measurement; I-V measurement; Monte Carlo simulations; SONOS flash cells; flash EEPROMs; interface-trap generation; programmed SONOS devices; trapped charge profiling; Channel hot electron injection; Charge measurement; Current measurement; Degradation; EPROM; Electric variables measurement; Electron traps; Electronic mail; Pulse measurements; SONOS devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2004. IEDM Technical Digest. IEEE International
Print_ISBN :
0-7803-8684-1
Type :
conf
DOI :
10.1109/IEDM.2004.1419170
Filename :
1419170
Link To Document :
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