DocumentCode :
3003575
Title :
Capacitance modeling of laterally non-uniform MOS devices
Author :
Aarts, A.C.T. ; van der Hout, R. ; Paasschens, J.C.J. ; Scholten, A.J. ; Willemsen, M. ; Klaassen, D.B.M.
Author_Institution :
Philips Res. Labs., Eindhoven, Netherlands
fYear :
2004
fDate :
13-15 Dec. 2004
Firstpage :
751
Lastpage :
754
Abstract :
In compact transistor modeling for circuit simulation, the capacitances of conventional MOS devices are commonly determined as the derivatives of terminal charges, which on their turn are obtained from the so-called Ward-Dutton charge partitioning scheme (Ward, 1981). For devices with a laterally non-uniform channel doping profile, however, it is shown in this paper that: 1) no terminal charges exist for the description of capacitances. Instead, 2) a model is presented for the capacitances of such devices, including numerical results for a MOS transistor with a laterally diffused channel doping profile. Finally, 3) a method is given to incorporate such a capacitance model in circuit simulators which are traditionally based on terminal charge models.
Keywords :
MOSFET; capacitance; circuit simulation; doping profiles; semiconductor device models; MOS transistor; Ward-Dutton charge partitioning scheme; capacitance modeling; circuit simulation; compact transistor modeling; laterally diffused channel doping profile; laterally nonuniform MOS devices; laterally nonuniform channel doping profile; terminal charges; Capacitance; Circuit simulation; Circuit testing; Doping profiles; Laboratories; MOS devices; MOSFETs; Power supplies; Semiconductor process modeling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2004. IEDM Technical Digest. IEEE International
Print_ISBN :
0-7803-8684-1
Type :
conf
DOI :
10.1109/IEDM.2004.1419281
Filename :
1419281
Link To Document :
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