• DocumentCode
    3005760
  • Title

    4H-SiC and Si Based IGBTs/VDMOSFETs Characters Comparison

  • Author

    Yuan, Shoucai ; Zhang, Qi ; Liu, Yamei ; Zhang, Yi

  • Author_Institution
    Sch. of Phys. & Electron. Inf., GanNan Normal Univ., Ganzhou, China
  • fYear
    2012
  • fDate
    21-23 May 2012
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In order to compare the performance differences of IGBTs/VDMOSFETs based on wide bandgap material 4H-SiC and silicon(Si), the basic theory of semiconductor physics for 4H-SiC and Si was used to describe the quantitative relationship of carrier mobility with doping concentration, output I-V curves with devices design and fabrication parameters, switching characteristics with material properties and devices rating voltage. MATLAB software was used to calculate those above characteristics, the calculation results show that, for given doping concentration, the carrier mobility of 4H-SiC is lower than that of silicon, so its conducting output currents are also smaller than that of silicon in the same design rule of same chip area and same devices terminal bias conditions, for example, when 4H-SiC and Si with same doping concentration of 1015cm-3 and same bias conditions of gate-source voltage 18V/drain-source voltage 2V, the carrier mobility and conducting current are 990.9cm2/V/s and 6.686mA for 4H-SiC, which is only about 74.4% and 55.9% that of silicon with value of 1332.0cm2/V/s and 11.950mA, respectively. However, for devices breakdown voltage of 4000V, the turn-on time for 4H-SiC, 27.88ns, is shorter than that of silicon, 110.30ns, this is because the wide bandgap material 4H-SiC will have higher epilayer doping concentration and thinner epilayer thickness when compared with silicon for given devices blocking voltage, this will lead the more fast turn-on and switching characteristics of 4H-SiC devices than that of Si devices.
  • Keywords
    carrier mobility; electric breakdown; insulated gate bipolar transistors; power MOSFET; semiconductor doping; silicon; silicon compounds; wide band gap semiconductors; 4H-SiC and Si Based; IGBTs-VDMOSFETs; MATLAB software; SiC; carrier mobility; chip area; conducting output currents; current 11.95 mA; current 6.686 mA; device switching characteristics; devices blocking voltage; devices breakdown voltage; devices design; devices rating voltage; epilayer doping concentration; epilayer thickness; fabrication parameters; gate-source voltage; material properties; output I-V curves; semiconductor physics; time 110.30 ns; time 27.88 ns; voltage 4000 V; Doping; Epitaxial layers; Insulated gate bipolar transistors; Photonic band gap; Resistance; Silicon; Switches;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photonics and Optoelectronics (SOPO), 2012 Symposium on
  • Conference_Location
    Shanghai
  • ISSN
    2156-8464
  • Print_ISBN
    978-1-4577-0909-8
  • Type

    conf

  • DOI
    10.1109/SOPO.2012.6271084
  • Filename
    6271084