DocumentCode
3005872
Title
Aluminum plug formation by excimer laser irradiation for planarized multilevel metallization
Author
Mukai, R. ; Kobayashi, K. ; Nakano, M.
Author_Institution
Fujitsu Ltd., Kawasaki, Japan
fYear
1989
fDate
12-13 Jun 1989
Firstpage
495
Abstract
Summary form only given. An aluminum-plug-formation technique achieved by excimer laser irradiation for planarized multilevel metallization is presented. The plug was formed by pyrolytic reactions using pulses from an XeCl excimer laser (150 mJ). The optical pulses are focused on an optical system to increase optical fluence. The optical system redefines and homogenizes the laser beam to a size of 2×2 mm2 and is mounted on an X-Y stage which tracks the beam across the sample. A plug formed by four pulses is shown. During the irradiation, the sample was kept at room temperature, and the total of the amount of aluminum was controlled to just fill in each via hole. On the resulting surface insulator, aluminum is not found
Keywords
aluminium; laser beam applications; metallisation; pyrolysis; Al plug formation; X-Y stage; XeCl; excimer laser irradiation; optical fluence; optical pulses; planarized multilevel metallization; pyrolytic reactions; via hole; Aluminum; Filling; Laser beams; Metallization; Optical films; Optical pulses; Optical refraction; Particle beam optics; Planarization; Plugs;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Multilevel Interconnection Conference, 1989. Proceedings., Sixth International IEEE
Conference_Location
Santa Clara, CA
Type
conf
DOI
10.1109/VMIC.1989.78049
Filename
78049
Link To Document