DocumentCode :
3006857
Title :
Transparent Thin-Film Characterization by Using Differential Optical Sectioning Interference Microscopy
Author :
Wang, Chun-Chieh ; Jian, Hong-Jhang ; Lee, Chau-Hwang
Author_Institution :
Nat. Chung Cheng Univ., Chia-Yi
fYear :
2007
fDate :
6-11 May 2007
Firstpage :
1
Lastpage :
2
Abstract :
Differential optical sectioning interference microscopy is proposed for measuring the refractive index (n) and thickness (d) of transparent thin films with sub-micrometer lateral resolution. We demonstrate this technique with a 100-nm SiO2 layer on Si.
Keywords :
optical microscopy; silicon compounds; thin films; transparency; SiO2; differential optical sectioning interference microscopy; refractive index; size 100 nm; sub micrometer lateral resolution; thickness; transparent thin film characterization; Interference; Optical films; Optical filters; Optical microscopy; Optical refraction; Optical sensors; Optical variables control; Refractive index; Transistors; Wavelength measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-834-6
Type :
conf
DOI :
10.1109/CLEO.2007.4452706
Filename :
4452706
Link To Document :
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