DocumentCode :
3009123
Title :
Electron-Beam Lithography Techniques for Micro- and Nano-scale Surface Structure Current Injection Lasers
Author :
DeRose, Guy A. ; Zhu, Lin ; Poon, Joyce K S ; Yariv, Amnon ; Scherer, Axel
Author_Institution :
California Inst. of Technol., Pasadena
fYear :
2007
fDate :
6-11 May 2007
Firstpage :
1
Lastpage :
2
Abstract :
We demonstrate nanoscale patterning and overlay of two-dimensional gratings and waveguides with accuracy better than 45 nm using electron-beam lithography for surface structure lasers with large areas.
Keywords :
diffraction gratings; electron beam lithography; nanopatterning; optical waveguides; semiconductor lasers; surface structure; electron-beam lithography; nanoscale patterning; surface structure current injection lasers; two-dimensional gratings overlay; waveguides; Etching; Lithography; Nanostructures; Optical device fabrication; Optical surface waves; Optical waveguides; Semiconductor lasers; Surface emitting lasers; Surface structures; Waveguide lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-834-6
Type :
conf
DOI :
10.1109/CLEO.2007.4452835
Filename :
4452835
Link To Document :
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