DocumentCode
3009123
Title
Electron-Beam Lithography Techniques for Micro- and Nano-scale Surface Structure Current Injection Lasers
Author
DeRose, Guy A. ; Zhu, Lin ; Poon, Joyce K S ; Yariv, Amnon ; Scherer, Axel
Author_Institution
California Inst. of Technol., Pasadena
fYear
2007
fDate
6-11 May 2007
Firstpage
1
Lastpage
2
Abstract
We demonstrate nanoscale patterning and overlay of two-dimensional gratings and waveguides with accuracy better than 45 nm using electron-beam lithography for surface structure lasers with large areas.
Keywords
diffraction gratings; electron beam lithography; nanopatterning; optical waveguides; semiconductor lasers; surface structure; electron-beam lithography; nanoscale patterning; surface structure current injection lasers; two-dimensional gratings overlay; waveguides; Etching; Lithography; Nanostructures; Optical device fabrication; Optical surface waves; Optical waveguides; Semiconductor lasers; Surface emitting lasers; Surface structures; Waveguide lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location
Baltimore, MD
Print_ISBN
978-1-55752-834-6
Type
conf
DOI
10.1109/CLEO.2007.4452835
Filename
4452835
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