• DocumentCode
    3011203
  • Title

    SEMATECH and the factory of the future

  • Author

    Deininger, C. Richard

  • fYear
    1992
  • fDate
    15-16 Jun 1992
  • Firstpage
    31
  • Lastpage
    32
  • Abstract
    It is noted that from now through the year 2000, US semiconductor manufacturing lines will undergo remarkable changes. SEMATECH´s role in helping shape those changes as it works with the industry to develop manufacturing techniques that will withstand ever-greater pressures for cost-containment, precision processing, and submicron geometries is discussed. SEMATECH is driving efforts to improve manufacturing productivity by taking advantage of the US´s strength in systems. Doing so requires an intimate understanding of past, present, and future fab drivers and parametrics. According to SEMATECH, the factory of the future must be an information-based, precision-manufacturing operation that is fully computerized and controlled using microenvironments, with automation. Use of CIM (computer-integrated manufacturing), vastly lower defect densities, appropriate automation, and improved environmental controls will be critical. The bottom line is that paradigm shifts must occur in wafer handling, wafer processing, material purities, fab organization, CIM and more
  • Keywords
    VLSI; electronics industry; factory automation; integrated circuit manufacture; management; CIM; IC manufacturing; SEMATECH; USA; VLSI; automation; bottom line; computer-integrated manufacturing; cost-containment; environmental controls; fab organization; fabrication drivers; fabrication parametrics; factory of the future; fully computerized; information based manufacturing; manufacturing productivity; material purities; microenvironments; paradigm shifts; precision processing; precision-manufacturing operation; semiconductor manufacturing lines; submicron geometries; wafer handling; wafer processing; Automatic control; Computer integrated manufacturing; Geometry; Manufacturing automation; Manufacturing industries; Manufacturing processes; Production facilities; Productivity; Semiconductor device manufacture; Shape;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing Science Symposium, 1992. ISMSS 1992., IEEE/SEMI International
  • Conference_Location
    San Francisco, CA
  • Print_ISBN
    0-7803-0680-5
  • Type

    conf

  • DOI
    10.1109/ISMSS.1992.197631
  • Filename
    197631