• DocumentCode
    3011858
  • Title

    Metallic-Contamination-Induced Optical Loss in Silicon Microphotonic Waveguides

  • Author

    Barwicz, Tymon ; Holzwarth, Charles W. ; Rakich, Peter T. ; Popovic, Milos A. ; Ippen, Erich I. ; Smith, Henry I.

  • Author_Institution
    IBM T.J. Watson Res. Center, Yorktown Heights
  • fYear
    2007
  • fDate
    6-11 May 2007
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We report on optical loss reaching 100 dB/cm observed in Si wire waveguides defined by reactive-ion etching in the proximity of metals with a low temperature of silicide formation.
  • Keywords
    contamination; micro-optics; optical fibre losses; silicon; sputter etching; Si; Si wire waveguides; metallic-contamination-induced optical loss; reactive-ion etching; silicide formation; silicon microphotonic waveguides; Atom optics; Etching; Nickel; Optical attenuators; Optical losses; Optical scattering; Optical waveguides; Propagation losses; Silicides; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
  • Conference_Location
    Baltimore, MD
  • Print_ISBN
    978-1-55752-834-6
  • Type

    conf

  • DOI
    10.1109/CLEO.2007.4452985
  • Filename
    4452985