DocumentCode
3011858
Title
Metallic-Contamination-Induced Optical Loss in Silicon Microphotonic Waveguides
Author
Barwicz, Tymon ; Holzwarth, Charles W. ; Rakich, Peter T. ; Popovic, Milos A. ; Ippen, Erich I. ; Smith, Henry I.
Author_Institution
IBM T.J. Watson Res. Center, Yorktown Heights
fYear
2007
fDate
6-11 May 2007
Firstpage
1
Lastpage
2
Abstract
We report on optical loss reaching 100 dB/cm observed in Si wire waveguides defined by reactive-ion etching in the proximity of metals with a low temperature of silicide formation.
Keywords
contamination; micro-optics; optical fibre losses; silicon; sputter etching; Si; Si wire waveguides; metallic-contamination-induced optical loss; reactive-ion etching; silicide formation; silicon microphotonic waveguides; Atom optics; Etching; Nickel; Optical attenuators; Optical losses; Optical scattering; Optical waveguides; Propagation losses; Silicides; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location
Baltimore, MD
Print_ISBN
978-1-55752-834-6
Type
conf
DOI
10.1109/CLEO.2007.4452985
Filename
4452985
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