DocumentCode :
3012669
Title :
Energy Distribution Of Tunneling Emission From Si-gate MOS Cathode
Author :
Yokoo, K. ; Sato, S. ; Koshita, G. ; Murota, J. ; Ono, S.
Author_Institution :
Tohoku University
fYear :
1993
fDate :
12-15 Jul 1993
Firstpage :
169
Lastpage :
170
Keywords :
Acceleration; Amorphous materials; Cathodes; Current density; Electron emission; Low voltage; Reproducibility of results; Scattering; Steady-state; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1993., Proceedings of IEEE 6th International
Print_ISBN :
0-7803-0852-2
Type :
conf
DOI :
10.1109/IVMC.1993.700336
Filename :
700336
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3012669
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