DocumentCode
3013576
Title
Visible to infrared light emission from reverse defect engineered silicon junctions
Author
Morschbach, M. ; Oehme, M. ; Werner, J. ; Kasper, E.
Author_Institution
Inst. of Semicond. Eng., Univ. Stuttgart, Stuttgart
fYear
2008
fDate
17-19 Sept. 2008
Firstpage
32
Lastpage
34
Abstract
Experimental results of light emission by defect engineered silicon pn-junctions, operated at room temperature under reverse bias, are presented. The devices emit light from the visible up to the infrared. As will be shown the emission is enhanced by the usage of a defect engineered layer structure. For the present research an improvement up to 280% in efficiency is observed. Defect engineered layers also provide a highly focused light emission - emission spots of app. 1 mum in diameter are observable. The data of two different defect engineered samples will be compared with a defect free reference to show the advantages of defect engineered layers.
Keywords
crystal defects; elemental semiconductors; light emitting diodes; p-n junctions; silicon; Si; light emitting diode; p-n junction; reverse defect engineered silicon junction; temperature 293 K to 298 K; visible-infrared light emission; Data engineering; Germanium silicon alloys; High speed optical techniques; Integrated optics; Light emitting diodes; Molecular beam epitaxial growth; Optical surface waves; Semiconductor diodes; Silicon germanium; Temperature; SiGe; defect engineering; light-emitting diodes; quantum well; silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2008 5th IEEE International Conference on
Conference_Location
Cardiff
Print_ISBN
978-1-4244-1769-8
Electronic_ISBN
978-1-4244-1768-1
Type
conf
DOI
10.1109/GROUP4.2008.4638087
Filename
4638087
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