• DocumentCode
    3013576
  • Title

    Visible to infrared light emission from reverse defect engineered silicon junctions

  • Author

    Morschbach, M. ; Oehme, M. ; Werner, J. ; Kasper, E.

  • Author_Institution
    Inst. of Semicond. Eng., Univ. Stuttgart, Stuttgart
  • fYear
    2008
  • fDate
    17-19 Sept. 2008
  • Firstpage
    32
  • Lastpage
    34
  • Abstract
    Experimental results of light emission by defect engineered silicon pn-junctions, operated at room temperature under reverse bias, are presented. The devices emit light from the visible up to the infrared. As will be shown the emission is enhanced by the usage of a defect engineered layer structure. For the present research an improvement up to 280% in efficiency is observed. Defect engineered layers also provide a highly focused light emission - emission spots of app. 1 mum in diameter are observable. The data of two different defect engineered samples will be compared with a defect free reference to show the advantages of defect engineered layers.
  • Keywords
    crystal defects; elemental semiconductors; light emitting diodes; p-n junctions; silicon; Si; light emitting diode; p-n junction; reverse defect engineered silicon junction; temperature 293 K to 298 K; visible-infrared light emission; Data engineering; Germanium silicon alloys; High speed optical techniques; Integrated optics; Light emitting diodes; Molecular beam epitaxial growth; Optical surface waves; Semiconductor diodes; Silicon germanium; Temperature; SiGe; defect engineering; light-emitting diodes; quantum well; silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Group IV Photonics, 2008 5th IEEE International Conference on
  • Conference_Location
    Cardiff
  • Print_ISBN
    978-1-4244-1769-8
  • Electronic_ISBN
    978-1-4244-1768-1
  • Type

    conf

  • DOI
    10.1109/GROUP4.2008.4638087
  • Filename
    4638087