DocumentCode
3014035
Title
Silicon based photonic quantum dots
Author
Chen, Kunji ; Chen, San ; Qian, Bo ; Zhang, Xiangao ; Li, Wei ; Xu, Jun ; Huang, Xinfan
Author_Institution
Nat. Lab. of Solid State Microstructures, Nanjing Univ., Nanjing
fYear
2008
fDate
17-19 Sept. 2008
Firstpage
102
Lastpage
104
Abstract
We use a patterned conformal deposition technique to fabricate Si-based 3D optical microcavities. The size-dependent confined photonic modes were observed when the size is reduced to 1.0 mum which is similar to the quantum effect of electronic states in semiconductor quantum dots.
Keywords
elemental semiconductors; micro-optics; microcavities; optical fabrication; photonic band gap; plasma CVD; semiconductor quantum dots; silicon; 3D optical microcavity fabrication; Si; confined photonic modes; electronic states; patterned conformal deposition method; plasma-enhanced chemical-vapor deposition system; quantum effect; semiconductor quantum dot; silicon based photonic quantum dots; Microcavities; Optical films; Optical refraction; Optical scattering; Optical variables control; Quantum dots; Resonance; Scanning electron microscopy; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics, 2008 5th IEEE International Conference on
Conference_Location
Cardiff
Print_ISBN
978-1-4244-1769-8
Electronic_ISBN
978-1-4244-1768-1
Type
conf
DOI
10.1109/GROUP4.2008.4638111
Filename
4638111
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