• DocumentCode
    3014255
  • Title

    On the drift behaviors of a phase change memory (PCM) cell

  • Author

    Junsangsri, Pilin ; Jie Han ; Lombardi, Floriana

  • Author_Institution
    Electr. & Comput. Eng. Dept., Northeastern Univ., Boston, MA, USA
  • fYear
    2013
  • fDate
    5-8 Aug. 2013
  • Firstpage
    1145
  • Lastpage
    1150
  • Abstract
    This paper presents a HSPICE macromodel of a phase change memory (PCM) by considering the phenomenon of drift behavior as leading to incorrect operation. The model simulates the behavior due to the drift in the resistance and threshold voltage when the cell is not been read or programmed. It considers not only the resistance change by phase (as corresponding to the two phases, amorphous and crystalline), but also the temperature, the crystalline fraction and the continuous profile of the resistance. This electrical based modeling by HSPICE allows to fully characterizing the holding voltage and the continuous behavior of the PCM resistance, while assessing the impact of the programming time of the drifted parameters. The proposed macromodel generates the I-V and R-I plots of a PCM cell at a very small error compared with experimental data. A detailed sensitivity analysis of the electrical parameters of the PCM cell is pursued to show the robust characteristics of the proposed macromodel to capture the variation in parameters due to drift.
  • Keywords
    SPICE; integrated circuit modelling; phase change memories; sensitivity analysis; HSPICE macromodel; I-V plot; PCM cell; PCM resistance; R-I plot; amorphous phase; crystalline phase; drift behaviors; electrical based modeling; electrical parameters; phase change memory cell; programming time; sensitivity analysis; threshold voltage; Integrated circuit modeling; Phase change materials; Programming; Resistance; Switches; Switching circuits; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on
  • Conference_Location
    Beijing
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4799-0675-8
  • Type

    conf

  • DOI
    10.1109/NANO.2013.6720800
  • Filename
    6720800