Title :
SOI submicron rib waveguides: Design, fabrication and characterization
Author :
Xu, Xuejun ; Chen, Shaowu ; Li, Zhiyong ; Yu, Yude ; Yu, Jinzhong
Author_Institution :
State Key Lab. on Integrated Optoelectron., Chinese Acad. of Sci., Beijing
Abstract :
We present detailed design, fabrication, and characterization issues of submicron rib waveguides based on silicon-on-insulator. The waveguides fabricated by EBL and ICP processes have propagation loss of 1.8 dB/mm and bend loss of 0.14 dB/90deg for bends with radius of 5 mum.
Keywords :
electron beam lithography; optical waveguides; rib waveguides; silicon-on-insulator; sputter etching; bend loss; electron-beam lithography; inductively coupled plasma dry etching; propagation loss; radius 5 mum; silicon-on-insulator; submicron rib waveguides; CMOS process; CMOS technology; Dry etching; Lithography; Optical device fabrication; Optical fiber polarization; Plasma measurements; Propagation losses; Silicon; Tellurium;
Conference_Titel :
Group IV Photonics, 2008 5th IEEE International Conference on
Conference_Location :
Cardiff
Print_ISBN :
978-1-4244-1769-8
Electronic_ISBN :
978-1-4244-1768-1
DOI :
10.1109/GROUP4.2008.4638123
