• DocumentCode
    3014489
  • Title

    ESD protection design for radio-frequency integrated circuits in nanoscale CMOS technology

  • Author

    Chun-Yu Lin ; Li-Wei Chu ; Shiang-Yu Tsai ; Ming-Dou Ker ; Ming-Hsiang Song ; Chewn-Pu Jou ; Tse-Hua Lu ; Jen-Chou Tseng ; Ming-Hsien Tsai ; Tsun-Lai Hsu ; Ping-Fang Hung ; Yu-Lin Wei ; Tzu-Heng Chang

  • Author_Institution
    Inst. of Electron., Nat. Chiao Tung Univ., Hsinchu, Taiwan
  • fYear
    2013
  • fDate
    5-8 Aug. 2013
  • Firstpage
    241
  • Lastpage
    244
  • Abstract
    Nanoscale CMOS technologies have been used to implement the radio-frequency integrated circuits. However, the thinner gate oxide in nanoscale CMOS technology seriously degrades the electrostatic discharge (ESD) robustness of IC products. Therefore, on-chip ESD protection designs must be added at all input/output pads in CMOS chip. To minimize the impacts from ESD protection on circuit performances, ESD protection at input/output pads must be carefully designed. In this work, a new proposed ESD protection design has been realized in a nanoscale CMOS process. Experimental results of the test circuits have been successfully verified, including RF performances, I-V characteristics, and ESD robustness.
  • Keywords
    CMOS integrated circuits; electrostatic discharge; integrated circuit design; radiofrequency integrated circuits; CMOS chip; ESD protection; I-V characteristics; electrostatic discharge robustness; gate oxide; integrated circuit products; nanoscale CMOS technology; radiofrequency integrated circuits; CMOS integrated circuits; CMOS technology; Electrostatic discharges; Parasitic capacitance; Radio frequency; Robustness; Thyristors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on
  • Conference_Location
    Beijing
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4799-0675-8
  • Type

    conf

  • DOI
    10.1109/NANO.2013.6720810
  • Filename
    6720810