DocumentCode :
3015205
Title :
Design, fabrication, and characterization of an α-Si:H/α-SiCN multistack waveguide for electro optical modulation
Author :
Rao, Sandro ; Della Corte, Francesco G. ; Summonte, Caterina ; Suriano, Francesco
Author_Institution :
Dept. of Inf. Sci., Math., Electron. & Transportations, Mediterranea Univ., Reggio Calabria
fYear :
2008
fDate :
17-19 Sept. 2008
Firstpage :
279
Lastpage :
281
Abstract :
Electro-optical absorption in alpha-Si:H/alpha-SiCxNy multilayers has been studied in three different planar multistack waveguides realized by PECVD technology. Light absorption is induced at lambda=1.55 mum by carrier accumulation through the application of electric field across the multiple insulator/semiconductor device.
Keywords :
electro-optical modulation; elemental semiconductors; optical waveguides; plasma CVD; silicon; silicon compounds; PECVD; Si-SiCN; electro optical modulation; multiple insulator/semiconductor device; planar multistack waveguides; Absorption; Electrooptical waveguides; Nonhomogeneous media; Optical design; Optical device fabrication; Optical modulation; Optical planar waveguides; Optical waveguides; Planar waveguides; Semiconductor waveguides;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Group IV Photonics, 2008 5th IEEE International Conference on
Conference_Location :
Cardiff
Print_ISBN :
978-1-4244-1769-8
Electronic_ISBN :
978-1-4244-1768-1
Type :
conf
DOI :
10.1109/GROUP4.2008.4638172
Filename :
4638172
Link To Document :
بازگشت