DocumentCode :
3015585
Title :
High current plasma electron emitter
Author :
Fiksel, G. ; Craig, D. ; Hartog, D.J.D. ; Holly, D. ; Kendrick, R. ; Lovell, T.W. ; Oliva, S. ; Prager, S.C. ; Sarff, J.S. ; Thomas, M.A.
Author_Institution :
Sterling Sci. Inc., Madison, WI, USA
fYear :
1996
fDate :
3-5 June 1996
Firstpage :
219
Abstract :
Summary form only given, as follows. A high current plasma electron emitter based on a miniature plasma source has been developed. The source is characterized by a high electron emission current density and emission current, small size, and low impurity content. The emitting plasma is created by a pulsed high current gas discharge. The source is biased negatively to extract electrons. Electron currents of the order of 1 kA at a bias voltage of about 100 V are obtained. The source has a simple design and has proven to be very reliable in operation. Extensive studies of the effect of the source geometry and materials have been conducted. The gas feed through, power dissipation, and impurity content were measured. A high emission current, small size (3-4 cm in diameter), and low impurity generation make the source attractive for a variety of fusion and technological applications. Injectors with 1 kA electron emission current and a pulse duration of 10 ms will be used for a 20 kA electrostatic current injection experiment in the Madison Symmetric Torus (MST) reversed-field pinch.
Keywords :
plasma devices; 1 kA; 100 V; 20 kA; MST; Madison Symmetric Torus reversed-field pinch; electron currents; electron emission current density; electrostatic current injection; fusion applications; high current plasma electron emitter; impurity generation; miniature plasma source; power dissipation; pulsed high current gas discharge; source geometry; technological applications; Conducting materials; Current density; Discharges; Electron emission; Electron guns; Geometry; Impurities; Plasma density; Plasma sources; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
Conference_Location :
Boston, MA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-3322-5
Type :
conf
DOI :
10.1109/PLASMA.1996.550936
Filename :
550936
Link To Document :
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