• DocumentCode
    3016241
  • Title

    Development of ferromagnetic shape memory alloy - silicon bimorph nanoactuators

  • Author

    Lay, Christian ; Aseguinolaza, Ivan ; Chernenko, Volodymyr ; Kohl, Michael

  • Author_Institution
    Inst. of Microstructure Technol., Karlsruhe Inst. of Technol., Karlsruhe, Germany
  • fYear
    2013
  • fDate
    5-8 Aug. 2013
  • Firstpage
    954
  • Lastpage
    957
  • Abstract
    This paper presents the development and fabrication of first-of-its kind free-standing ferromagnetic shape memory alloy (FSMA)/Si bimorph cantilevers. The exploitation of FSMAs such as Ni-Mn-Ga is of large interest for nanoactuation due to their multifunctional ferromagnetic and shape memory properties allowing for large work density. A new nanofabrication process is developed consisting of electron-beam lithography, Si reactive ion etching and the deposition of Ni-Mn-Ga films on pre-structured Si substrates. For decreasing dimensions of Si nanocantilevers, a pronounced size effect of self-organized FSMA deposition is observed once the cantilever width matches the grain size of 100 nm, which is comparable to the size of magnetic domains.
  • Keywords
    actuators; alloys; cantilevers; electron beam lithography; elemental semiconductors; ferromagnetic materials; gallium; manganese; nanofabrication; nickel; silicon; sputter etching; Ni-Mn-Ga; Si; electron-beam lithography; ferromagnetic shape memory alloy; film deposition; magnetic domains; nanofabrication process; reactive ion etching; silicon bimorph cantilevers; silicon bimorph nanoactuators; size 100 nm; Films; Magnetic domains; Nanostructures; Resists; Shape; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on
  • Conference_Location
    Beijing
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4799-0675-8
  • Type

    conf

  • DOI
    10.1109/NANO.2013.6720892
  • Filename
    6720892