• DocumentCode
    3016588
  • Title

    Three-Dimensional Photonic Crystals Fabricated by Double-Angled Plasma Etching

  • Author

    Takahashi, Shigeki ; Nakamori, Takeshi ; Okano, Makoto ; Imada, Masahiro ; Noda, Susumu

  • Author_Institution
    Kyoto Univ., Kyoto
  • fYear
    2007
  • fDate
    6-11 May 2007
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Three-dimensional photonic crystals with a depth of two lattice constants are successfully fabricated by a two-stage angled plasma etching method. The sample showed ~90% reflectance and ~10 dB attenuation around the photonic bandgap wavelength region.
  • Keywords
    etching; lattice constants; light absorption; light reflection; optical fabrication; optical materials; photonic band gap; photonic crystals; plasma materials processing; attenuation parameters; double-angled plasma etching method; lattice constants; photonic bandgap wavelength region; reflectance parameters; three-dimensional photonic crystals fabrication; Etching; Lattices; Optical attenuators; Optical device fabrication; Personal communication networks; Photonic crystals; Plasma applications; Reflectivity; Stacking; Stimulated emission;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
  • Conference_Location
    Baltimore, MD
  • Print_ISBN
    978-1-55752-834-6
  • Type

    conf

  • DOI
    10.1109/CLEO.2007.4453246
  • Filename
    4453246
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3016588