• DocumentCode
    3017288
  • Title

    IDDQ Testing Method using a Scan Pattern for Production Testing

  • Author

    Hirase, Junichi ; Goi, Yoshiyuki ; Tanaka, Yoshiyuki

  • Author_Institution
    Matsushita Electric Industrial Co., Ltd.
  • fYear
    2005
  • fDate
    18-21 Dec. 2005
  • Firstpage
    18
  • Lastpage
    21
  • Abstract
    With the miniaturization of the diffusion process, the leak current per transistor tends to increase and the number of transistors per die tends to become larger, thus rendering more difficult the discrimination through the absolute value of IDDQ (Quiescent power supply current) that is required to detect defects on VLSI (Very Large Scale Integration). On the other hand, scan patterns convenient for their logical quality improvement are widely used. When adopting such a scan pattern and measuring the IDDQ, one finds that the measured values do not fluctuate greatly. In this paper, we will present a method of determining good and defective dies by making an approximation of this distribution using a gamma distribution and we will demonstrate the efficiency of our method through corroborative results.
  • Keywords
    Current supplies; Diffusion processes; Electricity supply industry; Equations; Fault detection; Leak detection; Process control; Production; Testing; Very large scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Test Symposium, 2005. Proceedings. 14th Asian
  • ISSN
    1081-7735
  • Print_ISBN
    0-7695-2481-8
  • Type

    conf

  • DOI
    10.1109/ATS.2005.66
  • Filename
    1575400