DocumentCode
3017288
Title
IDDQ Testing Method using a Scan Pattern for Production Testing
Author
Hirase, Junichi ; Goi, Yoshiyuki ; Tanaka, Yoshiyuki
Author_Institution
Matsushita Electric Industrial Co., Ltd.
fYear
2005
fDate
18-21 Dec. 2005
Firstpage
18
Lastpage
21
Abstract
With the miniaturization of the diffusion process, the leak current per transistor tends to increase and the number of transistors per die tends to become larger, thus rendering more difficult the discrimination through the absolute value of IDDQ (Quiescent power supply current) that is required to detect defects on VLSI (Very Large Scale Integration). On the other hand, scan patterns convenient for their logical quality improvement are widely used. When adopting such a scan pattern and measuring the IDDQ, one finds that the measured values do not fluctuate greatly. In this paper, we will present a method of determining good and defective dies by making an approximation of this distribution using a gamma distribution and we will demonstrate the efficiency of our method through corroborative results.
Keywords
Current supplies; Diffusion processes; Electricity supply industry; Equations; Fault detection; Leak detection; Process control; Production; Testing; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Test Symposium, 2005. Proceedings. 14th Asian
ISSN
1081-7735
Print_ISBN
0-7695-2481-8
Type
conf
DOI
10.1109/ATS.2005.66
Filename
1575400
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