Fabrication of large-scaled synergetic silicon nanowire arrays using metal-assisted chemical etching for solar cell applications

We fabricate Silicon nanowire (SiNW) arrays for solar-cell applications on 6-inch wafers employing metal-assisted chemical etching (MacEtch). It can reduce cost and energy consumption. However it is difficult to make uniform SiNW arrays on large size wafer. Here we demonstrate a simple method to achieve a uniform SiNW on 6 inch wafers. Moreover, optical properties and surface morphologies of 6 inch N-type pyramid/SiNW arrays and 6 inch P-type as-cut/SiNW arrays are investigated. Reflectance indicates the extensive light-trapping effect by the SiNW arrays. Thus, the improved MacEtch method is promising for future commercial mass production on large size wafers.