Reactive sputtering DC magnetron-deposited TiO2 thin films intended for photoelectrolysis of water for hydrogen production

Because of its photoelectrochemical properties, titanium dioxide is an attractive material in photoelectrolysis of water for hydrogen production. Magnetron sputtering is a common and practicable technique that has been used to deposit TiO₂ thin films with homogeneous uniformity and reproducibility for various applications. This work deals with the growth of anatse titanium dioxide on indium tin oxide substrate using reactive sputtering DC magnetron method to use them in hydrogen production. In view of the influence of processing techniques on the TiO₂ photoelectrochemical properties, the choice of the appropriate technique and the optimization of deposition parameters and thermal traitments must be suitable for efficient water splitting reactions into hydrogen and oxygen. Under the conditions of deposition, anatase TiO₂ thin films were prepared and the effect of annealing temperature on their structural and optical properties was examined. The X-ray analyzes and Raman spectroscopy show that the TiO₂ films with a thickness of 500 nm obtained after annealing at 350 and 450°C for 60 min of time deposition in an ambient air are anatase phase. The crystallite size of the films is increased with increasing annealing temperature. The deposited TiO₂ thin films have high transparency in the visible range and opaque in the UV region. The optical properties of the films are found to be closely related to the microstructure and crystallographic structure, which depend on the annealing temperature.