Simultaneous diagnostics of electron density and temperature in micoplasma reactor for scanning plasma etching

Microplasma has been applied widely in micro fabrication. The diagnostics of microplasma generated in the scanning plasmas etching system is critical during the system operation. An experimental system is setup to investigate microplasma parameters of the dc-driven microplasmas reactor operating in CHF₃ reactive gases at different gas pressure. The electron density and temperature was calculated from the optical emission spectral (OES) of the microplasmas based on Stark broadening of the Balmer lines of the hydrogen, H_β and H_γ. The results of this paper may provide experimental verification for the optimized design of operative conditions of microplasmas reactor.