Title :
Lithography, Plasmonics and Sub-wavelength Aperture Exposure Technology
Author :
Ngu, Yves ; Peckerar, Marty ; Liu, Xiaoping ; Dagenais, Mario ; Messina, Mike ; Barry, John
Author_Institution :
Univ. of Maryland, College Park
Abstract :
We report enhanced transmission of 250 nm radiation by sub-wavelength square aperture arrays on silver and demonstrate its use in optical lithography with far- reduced number of addressed pixels to produce very good edge acuity.
Keywords :
metallic thin films; photolithography; plasmonics; silver; ultraviolet spectra; Ag; edge acuity; metal thin film; optical lithography; plasmonics; radiation transmission; square aperture arrays; subwavelength aperture exposure; wavelength 250 nm; Apertures; Focusing; Image resolution; Lithography; Numerical analysis; Optical arrays; Plasmons; Resists; Silver; Transistors;
Conference_Titel :
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-834-6
DOI :
10.1109/CLEO.2007.4453356
