• DocumentCode
    3018864
  • Title

    Lithography, Plasmonics and Sub-wavelength Aperture Exposure Technology

  • Author

    Ngu, Yves ; Peckerar, Marty ; Liu, Xiaoping ; Dagenais, Mario ; Messina, Mike ; Barry, John

  • Author_Institution
    Univ. of Maryland, College Park
  • fYear
    2007
  • fDate
    6-11 May 2007
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We report enhanced transmission of 250 nm radiation by sub-wavelength square aperture arrays on silver and demonstrate its use in optical lithography with far- reduced number of addressed pixels to produce very good edge acuity.
  • Keywords
    metallic thin films; photolithography; plasmonics; silver; ultraviolet spectra; Ag; edge acuity; metal thin film; optical lithography; plasmonics; radiation transmission; square aperture arrays; subwavelength aperture exposure; wavelength 250 nm; Apertures; Focusing; Image resolution; Lithography; Numerical analysis; Optical arrays; Plasmons; Resists; Silver; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
  • Conference_Location
    Baltimore, MD
  • Print_ISBN
    978-1-55752-834-6
  • Type

    conf

  • DOI
    10.1109/CLEO.2007.4453356
  • Filename
    4453356
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3018864