Dual-axis microgyroscope with closed-loop detection

Author

An, S. ; Oh, Y.S. ; Lee, B.L. ; Park, K.Y. ; Kang, S.J. ; Choi, S.O. ; Go, Y.I. ; Song, C.M.

Author_Institution

Micro Syst. Lab., Samsung Adv. Inst. of Technol., Suwon, South Korea

fYear

1998

fDate

25-29 Jan 1998

Firstpage

328

Lastpage

333

Abstract

A dual-axis microgyroscope is fabricated by a surface micromachining process. A 7.0 μm-thick polysilicon layer deposited by LPCVD is used for the vibrating structure. We report the closed-loop rate detection of a microgyroscope based on the rotational vibration of the four plates. In particular, the structure utilizes a simple force-balancing torsional torque which does not need another top electrode layer to reduce the intrinsic nonlinearity of a capacitance-type sensor. The gyroscope is tested in a high vacuum chamber for a high Q-factor with hybrid signal-conditioning integrated circuit. The experiment resulted in a noise equivalent signal of 0.1 deg/sec

Keywords

CVD coatings; Q-factor; elemental semiconductors; gyroscopes; microsensors; silicon; vibration measurement; 7 mum; Si; capacitance-type sensor; closed-loop detection; closed-loop rate detection; dual-axis microgyroscope; electrode layer; force-balancing torsional torque; high Q-factor; high vacuum chamber; hybrid signal-conditioning integrated circuit; intrinsic nonlinearity; microgyroscope; noise equivalent signal; polysilicon layer; rotational vibration; surface micromachining; vibrating structure; Capacitance; Capacitive sensors; Circuit testing; Electrodes; Gyroscopes; Hybrid integrated circuits; Integrated circuit testing; Micromachining; Q factor; Torque;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 1998. MEMS 98. Proceedings., The Eleventh Annual International Workshop on

Conference_Location

Heidelberg

ISSN

1084-6999

Print_ISBN

0-7803-4412-X

Type

conf

DOI

10.1109/MEMSYS.1998.659777

Filename

659777