DocumentCode
3019432
Title
Substrate modeling and lumped substrate resistance extraction for CMOS ESD/latchup circuit simulation
Author
Li, Tong ; Tsai, Ching-Han ; Rosenbaum, Elyse ; Kang, Sung-Mo
Author_Institution
Silicon Perspective Corp., Santa Clara, CA, USA
fYear
1999
fDate
1999
Firstpage
549
Lastpage
554
Abstract
Due to interactions through the common silicon substrate, the layout and placement of devices and substrate contacts can have significant impacts on a circuit´s ESD (Electrostatic Discharge) and latchup behavior in CMOS technologies. Proper substrate modeling is thus required for circuit-level simulation to predict the circuit´s ESD performance and latchup immunity. In this work we propose a new substrate resistance network model, and develop a novel substrate resistance extraction method that accurately calculates the distribution of injection current into the substrate during ESD or latchup events. With the proposed substrate model and resistance extraction, we can capture the three-dimensional layout parasitics in the circuit as well as the vertical substrate doping profile, and simulate these effects on circuit behavior at the circuit-level accurately. The usefulness of this work for layout optimization is demonstrated with an industrial circuit example
Keywords
CMOS integrated circuits; VLSI; circuit simulation; current distribution; electrostatic discharge; integrated circuit layout; integrated circuit modelling; integrated circuit reliability; substrates; 3D layout parasitics; CMOS ESD/latchup circuit simulation; ESD performance; Si; Si substrate; circuit-level simulation; injection current distribution; latchup behavior; latchup immunity; layout; lumped substrate resistance extraction; placement; substrate modeling; substrate resistance network model; vertical substrate doping profile; Circuit simulation; Electric resistance; Electrostatic discharge; Immune system; Integrated circuit interconnections; Permission; Predictive models; Semiconductor device modeling; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation Conference, 1999. Proceedings. 36th
Conference_Location
New Orleans, LA
Print_ISBN
1-58113-092-9
Type
conf
DOI
10.1109/DAC.1999.781376
Filename
781376
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