Title :
Temperature Dependence of Ultrafast Laser Ablation Efficiency of Crystalline Silicon
Author :
Yahng, J.S. ; Jeoung, S.C.
Author_Institution :
Korea Res. Inst. of Stand. & Sci., Daejeon
Abstract :
Ultrafast laser ablation of crystalline silicon was investigated as a function of temperature. The ablation efficiency is slightly enhanced with an apparent decrease in ablation threshold and surface roughness at a high substrate temperature.
Keywords :
elemental semiconductors; high-speed optical techniques; laser ablation; silicon; surface roughness; Si; crystalline silicon; substrate temperature; surface roughness; ultrafast laser ablation efficiency; Crystallization; Laser ablation; Optical surface waves; Pulsed laser deposition; Rough surfaces; Silicon; Surface emitting lasers; Surface morphology; Temperature dependence; Ultrafast optics;
Conference_Titel :
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-834-6
DOI :
10.1109/CLEO.2007.4453395
