• DocumentCode
    3019986
  • Title

    Application of lithium niobate etch stop technology to SAW pressure sensors

  • Author

    Randles, Andrew B. ; Kuypers, Jan H. ; Esashi, Masayoshi ; Tanaka, Shuji

  • Author_Institution
    Dept. of Nanomech., Tohoku Univ., Sendai
  • fYear
    2008
  • fDate
    2-5 Nov. 2008
  • Firstpage
    1124
  • Lastpage
    1127
  • Abstract
    This paper presents a process technology to form thin diaphragms with sealed cavities in a lithium niobate (LiNbO3) wafer, which will be used for small and sensitive SAW-based pressure sensors. The process technology uses thermal inversion, wet etching with an electroplated Au mask, etch stop at the thermal inversion layer and Au-Au bonding. By the combination of an etch stop and pinhole-free masking, LiNbO3 thin diaphragms with thicknesses of several tens of mum to 10 mum were fabricated in 128deg Y cut LiNbO3 wafers. The Au-Au bonding of the LiNbO3 wafer gave hermetic sealing. In addition the etch profiles of the LiNbO3 wafer predicted by Wulff-Jaccodine plots and observed in experiments were compared, and good agreement was confirmed.
  • Keywords
    diaphragms; etching; lithium compounds; masks; micromachining; microsensors; pressure sensors; surface acoustic wave delay lines; surface acoustic wave transducers; ultrasonic transducers; LiNbO3; SAW based pressure sensors; SAW pressure sensors; Wulff-Jaccodine plots; electroplated gold mask; gold-gold bonding; hermetic sealing; lithium niobate wafer etch stop; pinhole free masking; process technology; sealed cavities; thermal inversion layer; thin diaphragms; wet etching; Acoustic devices; Acoustic sensors; Delay; Etching; Lithium niobate; Paper technology; Sensor phenomena and characterization; Surface acoustic waves; Transducers; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium, 2008. IUS 2008. IEEE
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-2428-3
  • Electronic_ISBN
    978-1-4244-2480-1
  • Type

    conf

  • DOI
    10.1109/ULTSYM.2008.0271
  • Filename
    4803344