DocumentCode :
3020982
Title :
Drain resistance degradation under high fields in AlInAs/GaInAs MODFETs
Author :
Wakita, A.S. ; Rohdin, H. ; Su, C.-Y. ; Moll, N. ; Nagy, A. ; Robbins, V.M.
Author_Institution :
Hewlett-Packard Co., Palo Alto, CA, USA
fYear :
1997
fDate :
11-15 May 1997
Firstpage :
376
Lastpage :
379
Abstract :
Lattice-matched AlInAs/GaInAs modulation-doped FETs (MODFETs) demonstrate excellent high-frequency, small-signal performance. However, high-power, large-signal applications of these devices may be limited. Impact ionization and tunneling reduce the breakdown voltage, which limits the upper end of the output voltage swing, thus reducing the output power. Our results indicate that the lower end of the voltage swing (knee voltage) is also degraded by increased drain resistance when impact ionization occurs. In this work, we correlate Rd degradation in the AlInAs/GaInAs material system to the presence of impact ionization. The magnitude of Rd degradation depends on the applied drain bias and drain current. These factors affect the degree of impact ionization, and thus the extent of the degradation. Since Rd increases and Rs does not, only the high field side of the FET is affected. This increase in Rd is attributed to a wider carrier depletion region between the gate and drain after stress, which results in reduced device performance
Keywords :
III-V semiconductors; aluminium compounds; electric resistance; gallium arsenide; high electron mobility transistors; impact ionisation; indium compounds; semiconductor device testing; AlInAs-GaInAs; AlInAs/GaInAs MODFETs; InP; applied drain bias; breakdown voltage; carrier depletion region; drain current; drain resistance degradation; high field side; high fields; high-frequency small-signal performance; high-power large-signal applications; impact ionization; knee voltage; output power; output voltage swing; tunneling; Breakdown voltage; Degradation; Epitaxial layers; FETs; HEMTs; Impact ionization; Knee; MODFETs; Power generation; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1997., International Conference on
Conference_Location :
Cape Cod, MA
ISSN :
1092-8669
Print_ISBN :
0-7803-3898-7
Type :
conf
DOI :
10.1109/ICIPRM.1997.600164
Filename :
600164
Link To Document :
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