DocumentCode
3021992
Title
Analysis of charge effects in high frequency CMUTs
Author
Midtbø, Kjersti ; Rønnekleiv, Arne
Author_Institution
Dept. of Electron. & Telecommun., NTNU, Trondheim
fYear
2008
fDate
2-5 Nov. 2008
Firstpage
379
Lastpage
382
Abstract
This paper presents a theoretical analysis of charge effects in silicon nitride membranes in Capacitive Micromachined Ultrasonic Transducers (CMUTs) working at 30 MHz in air. The analysis was motivated by observations of drift in the resonance frequency to the CMUTs during electrical and heterodyne interferometric measurements while keeping the DC voltage level constant over time. After applying a DC voltage of -40 V for 3 hours, a drift of 0.6 MHz is observed. Analysis showed that this corresponded to a transfer of 15 per cent of the electrode charge into the silicon nitride membrane. While adjusting the voltage to keep the coupling factor constant equal to 0.5 and comparing a charge ratio of 0 and 1, the electrical Q-factor is increased by 8.5 % while the mechanical Q-factor is decreased by 7.8 % for a cavity height of 100 nm. The mechanical resonance frequency is reduced by 6.9 %. However, these changes are moderate and do not impact the response of the CMUT significantly in wide band transducer operation.
Keywords
Q-factor measurement; capacitive sensors; electrodes; electromechanical effects; membranes; micromachining; microsensors; resonance; ultrasonic transducers; SiN; capacitive micromachined ultrasonic transducer; charge effects; constant DC voltage level; electrical Q-factor; electrical interferometric measurement; electrode charge transport; electromechanical coupling; frequency 0.6 MHz; frequency 30 MHz; heterodyne interferometric measurement; high-frequency CMUT; mechanical Q-factor; mechanical resonance frequency; silicon nitride membrane; size 100 nm; time 3 h; voltage -40 V; Biomembranes; Electric variables measurement; Frequency measurement; Q factor; Resonance; Resonant frequency; Silicon; Time measurement; Ultrasonic transducers; Voltage; CMUT; charge effects; silicon nitride; theoretical analysis;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultrasonics Symposium, 2008. IUS 2008. IEEE
Conference_Location
Beijing
Print_ISBN
978-1-4244-2428-3
Electronic_ISBN
978-1-4244-2480-1
Type
conf
DOI
10.1109/ULTSYM.2008.0093
Filename
4803432
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