DocumentCode :
3023103
Title :
Effect of oxygen ratio to the transparency and conductivity of nanostructured ZnO thin films deposited by RF magnetron sputtering
Author :
Sin, N.D.M. ; Ahmad, Sahar ; Musa, M.Z. ; Mamat, M.H. ; Aziz, Aznita Abdul ; Rusop, M.
Author_Institution :
NANO-Electron. Centre, Univ. Teknol. MARA, Shah Alam, Malaysia
fYear :
2012
fDate :
19-21 Sept. 2012
Firstpage :
34
Lastpage :
37
Abstract :
The effect of oxygen ratio to the transparency and conductivity of nanostructured ZnO thin films deposited by RF magnetron sputtering are investigated. The effect of oxygen ratio at (0~10 sccm) on the ZnO thin films have been investigated. The I-V measurement specify that at ratio 45: 5 sccm (Ar:O2) show the highest conductivity. All films have show high highly transparent in the visible region which (>;80 %). The average transmittance in the visible range is 350 nm-1200 nm. The image of nanocolumnar size increase as the insertion of oxygen ratio increase.
Keywords :
electric current measurement; nanostructured materials; oxygen; semiconductor thin films; sputtering; transparency; voltage measurement; zinc compounds; I-V measurement; RF magnetron sputtering; ZnO; conductivity; nanocolumnar size increase; nanostructured thin films; oxygen ratio; transparency; Conductivity; Optical films; Radio frequency; Sputtering; Substrates; Zinc oxide; ZnO thin films; electrical properties; optical properties; oxygen flow rate; structural properties;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Electronics (ICSE), 2012 10th IEEE International Conference on
Conference_Location :
Kuala Lumpur
Print_ISBN :
978-1-4673-2395-6
Electronic_ISBN :
978-1-4673-2394-9
Type :
conf
DOI :
10.1109/SMElec.2012.6417085
Filename :
6417085
Link To Document :
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