• DocumentCode
    3023189
  • Title

    Diameter dependence of spin relaxation in SiGe nanowires

  • Author

    Bishnoi, B. ; Nandal, V. ; Ghosh, Bablu

  • Author_Institution
    Dept. of Electr. Eng., Indian Inst. of Technol. Kanpur, Kanpur, India
  • fYear
    2012
  • fDate
    19-21 Sept. 2012
  • Firstpage
    61
  • Lastpage
    64
  • Abstract
    In this paper, we use 1-D semi classical Monte Carlo Method to investigate spin polarized transport in SiGe nanowires (SiGeNWs) having Ge mole fraction 0.3. We use a multi-subbands semi classical Monte Carlo approach to model spin dephasing. Monte Carlo simulations have been widely adopted to study electron transport in devices and have recently been used in conjunction with spin density matrix calculations to model spin transport. Spin dephasing in SiGeNWs is caused due to D´yakonov-Perel (DP) relaxation and due to Elliott-Yafet (EY) relaxation. The spin polarization is studied along the length of the SiGeNWs. The ensemble averaged spin components variation has been studied for SiGeNWs along the nanowires length. The effect of variation of nanowires diameter on spin dephasing length has been studied. It is found that as the diameter of nanowires increases spin dephasing length also increases and become saturated beyond some value of diameter, this is due to the reduction in surface roughness scattering, which is a dominant contributor to the total scattering rate.
  • Keywords
    Ge-Si alloys; Monte Carlo methods; nanowires; spin polarised transport; surface roughness; surface scattering; 1D semiclassical Monte Carlo method; D´yakonov-Perel relaxation; DP relaxation; EY relaxation; Elliott-Yafet relaxation; Monte Carlo simulations; SiGe; averaged spin components variation; diameter dependence; electron transport; model spin transport; mole fraction; multisubbands semiclassical Monte Carlo approach; nanowires diameter; scattering rate; spin density matrix calculations; spin dephasing length; spin polarization; spin polarized transport; spin relaxation; surface roughness scattering; Electric fields; Monte Carlo methods; Nanowires; Scattering; Silicon; Silicon germanium; Vectors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Electronics (ICSE), 2012 10th IEEE International Conference on
  • Conference_Location
    Kuala Lumpur
  • Print_ISBN
    978-1-4673-2395-6
  • Electronic_ISBN
    978-1-4673-2394-9
  • Type

    conf

  • DOI
    10.1109/SMElec.2012.6417091
  • Filename
    6417091