DocumentCode
3023189
Title
Diameter dependence of spin relaxation in SiGe nanowires
Author
Bishnoi, B. ; Nandal, V. ; Ghosh, Bablu
Author_Institution
Dept. of Electr. Eng., Indian Inst. of Technol. Kanpur, Kanpur, India
fYear
2012
fDate
19-21 Sept. 2012
Firstpage
61
Lastpage
64
Abstract
In this paper, we use 1-D semi classical Monte Carlo Method to investigate spin polarized transport in SiGe nanowires (SiGeNWs) having Ge mole fraction 0.3. We use a multi-subbands semi classical Monte Carlo approach to model spin dephasing. Monte Carlo simulations have been widely adopted to study electron transport in devices and have recently been used in conjunction with spin density matrix calculations to model spin transport. Spin dephasing in SiGeNWs is caused due to D´yakonov-Perel (DP) relaxation and due to Elliott-Yafet (EY) relaxation. The spin polarization is studied along the length of the SiGeNWs. The ensemble averaged spin components variation has been studied for SiGeNWs along the nanowires length. The effect of variation of nanowires diameter on spin dephasing length has been studied. It is found that as the diameter of nanowires increases spin dephasing length also increases and become saturated beyond some value of diameter, this is due to the reduction in surface roughness scattering, which is a dominant contributor to the total scattering rate.
Keywords
Ge-Si alloys; Monte Carlo methods; nanowires; spin polarised transport; surface roughness; surface scattering; 1D semiclassical Monte Carlo method; D´yakonov-Perel relaxation; DP relaxation; EY relaxation; Elliott-Yafet relaxation; Monte Carlo simulations; SiGe; averaged spin components variation; diameter dependence; electron transport; model spin transport; mole fraction; multisubbands semiclassical Monte Carlo approach; nanowires diameter; scattering rate; spin density matrix calculations; spin dephasing length; spin polarization; spin polarized transport; spin relaxation; surface roughness scattering; Electric fields; Monte Carlo methods; Nanowires; Scattering; Silicon; Silicon germanium; Vectors;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Electronics (ICSE), 2012 10th IEEE International Conference on
Conference_Location
Kuala Lumpur
Print_ISBN
978-1-4673-2395-6
Electronic_ISBN
978-1-4673-2394-9
Type
conf
DOI
10.1109/SMElec.2012.6417091
Filename
6417091
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