Electrical properties of ZnO/TiO2 nanocomposite film deposited by simultaneous Radio-Frequency Magnetron sputtering

In this work, the ZnO/TiO₂ nanocomposite thin films were prepared by simultaneous Radio-Frequency Magnetron sputtering of ZnO and TiO₂ targets on glass substrates at different deposition times in the range of 30-75 minutes that increases the film thickness. The electrical and surface morphology were characterized by I-V measurement and atomic force microscopy (AFM) measurement respectively. The electrical characteristics indicate that the conductivity increases as the thickness increase due to the improvement in surface contact between particles and photocatalytic activity. High conductivity at 1.67×10^-4 S/cm and lowest resistivity about 5.14×10⁴ Ω/cm have been obtained for 75 minutes deposition time. Atomic force microscopy (AFM) showed particle size of ZnO/TIO₂ thin films increases from 26nm to 50nm with an increasing in deposition time.