• DocumentCode
    3023510
  • Title

    Fabrication of a dual-layer aluminum nanowires polarization filter array

  • Author

    Gruev, Viktor

  • Author_Institution
    Comput. Sci. & Eng., Washington Univ. in St. Louis, St. Louis, MO, USA
  • fYear
    2012
  • fDate
    20-23 May 2012
  • Firstpage
    3130
  • Lastpage
    3133
  • Abstract
    In this paper we present a procedure for fabricating an array of micropolarization filter array via an optimized interference lithography and microfabrication procedure. The filter array is composed of two linear polarization filters offset by 45 degrees with pixel pitch of 18 microns. The individual polarization filters are composed of aluminum nanowires with 140 nm pitch, 140 nm height and 70 nm width.
  • Keywords
    aluminium; filters; lithography; microfabrication; nanowires; Al; dual-layer nanowires polarization filter array; linear polarization filters offset; microfabrication procedure; micropolarization filter array; optimized interference lithography; size 70 nm; Arrays; Imaging; Maximum likelihood detection; Nanowires; Nonlinear filters; Optical filters; Sensors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Circuits and Systems (ISCAS), 2012 IEEE International Symposium on
  • Conference_Location
    Seoul
  • ISSN
    0271-4302
  • Print_ISBN
    978-1-4673-0218-0
  • Type

    conf

  • DOI
    10.1109/ISCAS.2012.6271985
  • Filename
    6271985