DocumentCode
3023510
Title
Fabrication of a dual-layer aluminum nanowires polarization filter array
Author
Gruev, Viktor
Author_Institution
Comput. Sci. & Eng., Washington Univ. in St. Louis, St. Louis, MO, USA
fYear
2012
fDate
20-23 May 2012
Firstpage
3130
Lastpage
3133
Abstract
In this paper we present a procedure for fabricating an array of micropolarization filter array via an optimized interference lithography and microfabrication procedure. The filter array is composed of two linear polarization filters offset by 45 degrees with pixel pitch of 18 microns. The individual polarization filters are composed of aluminum nanowires with 140 nm pitch, 140 nm height and 70 nm width.
Keywords
aluminium; filters; lithography; microfabrication; nanowires; Al; dual-layer nanowires polarization filter array; linear polarization filters offset; microfabrication procedure; micropolarization filter array; optimized interference lithography; size 70 nm; Arrays; Imaging; Maximum likelihood detection; Nanowires; Nonlinear filters; Optical filters; Sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
Circuits and Systems (ISCAS), 2012 IEEE International Symposium on
Conference_Location
Seoul
ISSN
0271-4302
Print_ISBN
978-1-4673-0218-0
Type
conf
DOI
10.1109/ISCAS.2012.6271985
Filename
6271985
Link To Document