Title :
Fabrication of a dual-layer aluminum nanowires polarization filter array
Author_Institution :
Comput. Sci. & Eng., Washington Univ. in St. Louis, St. Louis, MO, USA
Abstract :
In this paper we present a procedure for fabricating an array of micropolarization filter array via an optimized interference lithography and microfabrication procedure. The filter array is composed of two linear polarization filters offset by 45 degrees with pixel pitch of 18 microns. The individual polarization filters are composed of aluminum nanowires with 140 nm pitch, 140 nm height and 70 nm width.
Keywords :
aluminium; filters; lithography; microfabrication; nanowires; Al; dual-layer nanowires polarization filter array; linear polarization filters offset; microfabrication procedure; micropolarization filter array; optimized interference lithography; size 70 nm; Arrays; Imaging; Maximum likelihood detection; Nanowires; Nonlinear filters; Optical filters; Sensors;
Conference_Titel :
Circuits and Systems (ISCAS), 2012 IEEE International Symposium on
Conference_Location :
Seoul
Print_ISBN :
978-1-4673-0218-0
DOI :
10.1109/ISCAS.2012.6271985