Deposition of Titanium dioxide (TiO2) thin films using in-house Nano-TiO2 Powder

Author

Sahdan, Mohd Zainizan ; Alias, M.S. ; Nafarizal, N. ; Hashim, U.

Author_Institution

Microelectron. & Nanotechnol.-Shamsuddin Res. Centre, Univ. Tun Hussein Onn Malaysia, Batu Pahat, Malaysia

fYear

2012

fDate

19-21 Sept. 2012

Firstpage

267

Lastpage

270

Abstract

The purpose of this study is to fabricate uniform TiO2 thin films using in-house TiO2 nanopowder. The nanopowder was obtained from a tin mining waste (Ilmenite) and its concentration was optimized during fabrication. The TiO2 thin films were characterized by an atomic force microscope (AFM), a surface profiler, an X-ray diffractometer, an Ultra violet- Visible (UV-Vis) and a current-voltage (I-V) measurement system. The relation of the uniformity and the properties of the TiO2 thin films will be discussed in detail in this paper.

Keywords

atomic force microscopy; coating techniques; nanofabrication; nanoparticles; semiconductor thin films; titanium compounds; AFM; I-V measurement system; TiO₂; UV-Vis; X-ray diffractometer; atomic force microscope; current-voltage measurement system; deposition; mining waste; nanopowder; surface profiler; thin films fabrication; ultra violet-visible; Atomic measurements; Optical device fabrication; Optical films; Optical refraction; Powders; Titanium; Titanium dioxide (TiO2); atomic force microscope (AFM); ilmenite; solgel; thin films;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Electronics (ICSE), 2012 10th IEEE International Conference on

Conference_Location

Kuala Lumpur

Print_ISBN

978-1-4673-2395-6

Electronic_ISBN

978-1-4673-2394-9

Type

conf

DOI

10.1109/SMElec.2012.6417138

Filename

6417138