Title :
RF characteristics of AlGaN/GaN HEMTs under different temperatures
Author :
Yu-Sheng Chiu ; Jui-Chien Huang ; Tai-Ming Lin ; Yu-Ting Chou ; Chung-Yu Lu ; Chia-Ta Chang ; Chang, Edward Yi
Author_Institution :
Dept. of Mater. Sci. & Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Abstract :
We present the Rf characteristics of 0.7-μm gate length n-GaN/AlGaN/GaN high-electron mobility transistors (HEMTs) with different source-drain spacing tested under different temperatures. The 7-μm source-drain spacing device demonstrated 800 mA/mm drain current density and 257 mS/mm tranceconductance, and the 5-μm source-drain spacing device demonstrated 700 mA/mm drain current density and 260 mS/mm tranconductance. The 7-μm source-drain spacing device was measured at room temperatures of 25 °C and -40 °C, the current gain (fT) were 18 GHz and 21GHz and the maximum oscillation (fmax(U)) frequency were 63 GHz-and 87 GHz, respectively The fT was nearly linearly dependent on the temperature. As operating temperature increased from -40 °C to 50 °C, the fT dropped more dramatically for the 5-μm SD spacing device than for the 7-μm device. The fmax characteristic of 5-μm SD spacing device decreases more dramatically above 125 °C than the 7-μm SD spacing device. This phenomenon might be due to stronger phonon scattering for shorter channel device at high temperatures.
Keywords :
aluminium compounds; high electron mobility transistors; AlGaN; HEMT; RF characteristics; frequency 18 GHz; frequency 21 GHz; frequency 63 GHz; frequency 87 GHz; high-electron mobility transistors; size 0.7 mum; size 5 mum; size 7 mum; source-drain spacing device; temperature 293 K to 298 K; transconductance; Aluminum gallium nitride; Current density; Gallium nitride; HEMTs; MODFETs; Temperature; Temperature measurement;
Conference_Titel :
Semiconductor Electronics (ICSE), 2012 10th IEEE International Conference on
Conference_Location :
Kuala Lumpur
Print_ISBN :
978-1-4673-2395-6
Electronic_ISBN :
978-1-4673-2394-9
DOI :
10.1109/SMElec.2012.6417174