DocumentCode :
3025641
Title :
Atomic Hydrogen Two-Dimensional Fluorecence Measurements in Chemical Vapor Deposition
Author :
Lario, J. ; Walewski, J. ; Hernberg, R.
Author_Institution :
Tampere University of Technology
fYear :
1998
fDate :
18-18 Sept. 1998
Firstpage :
85
Lastpage :
85
Keywords :
Atomic layer deposition; Atomic measurements; Chemical vapor deposition; Delay; Fluorescence; Hydrogen; Plasma chemistry; Plasma measurements; Plasma temperature; Pulse measurements;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quantum Electronics Conference, 1998. 1998 EQEC. European
Conference_Location :
Glasgow, UK
Print_ISBN :
0-7803-4231-3
Type :
conf
DOI :
10.1109/EQEC.1998.714827
Filename :
714827
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3025641
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