DocumentCode
3026360
Title
Lifetime enhancement in EFG multicrystalline silicon [solar cells]
Author
Jeong, J.-W. ; Rohatgi, A. ; Rosenblum, M.D. ; Kalejs, J.P.
Author_Institution
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
fYear
2000
fDate
2000
Firstpage
83
Lastpage
86
Abstract
P and Al gettering and SiN-induced hydrogenation of EFG Si have been investigated using manufacturable process techniques. Annealing of SiN coated EFG, without Al on the back, shows very little defect passivation with maximum lifetime enhancement at 700°C. However, annealing of the SiN film, in the presence of Al, significantly increases the defect passivation and moves the optimum temperature to above 800°C. This increase in the optimum temperature is the result of tradeoff between the increase in the release of hydrogen from the SiN film and the decrease in the retention of hydrogen at defects at high temperatures. A higher annealing temperature (>800°C) is desirable because it produces a superior Al-BSF without sacrificing defect passivation. Finally, it is shown that the efficacy of the gettering and hydrogenation process is a strong function of the as-grown lifetime, which dictates the final lifetime as well as cell efficiency
Keywords
annealing; crystal growth from melt; elemental semiconductors; getters; hydrogenation; passivation; semiconductor growth; silicon; solar cells; 700 C; EFG; Si; annealing; annealing temperature; as-grown lifetime; defect passivation; edge-defined film-fed growth; efficiency; gettering; hydrogenation; lifetime enhancement; manufacturable process techniques; multicrystalline Si solar cells; Annealing; Artificial intelligence; Charge carrier lifetime; Costs; Gettering; Hydrogen; Passivation; Photovoltaic cells; Silicon compounds; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2000. Conference Record of the Twenty-Eighth IEEE
Conference_Location
Anchorage, AK
ISSN
0160-8371
Print_ISBN
0-7803-5772-8
Type
conf
DOI
10.1109/PVSC.2000.915758
Filename
915758
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