DocumentCode :
30277
Title :
20–40 GHz dual-gate frequency doubler using 0.5 μm GaAs pHEMT technology
Author :
Yuan Chun Li ; Fan-Hsiu Huang ; Quan Xue
Author_Institution :
Dept. of Electron. Eng., City Univ. of Hong Kong, Hong Kong, China
Volume :
50
Issue :
10
fYear :
2014
fDate :
May 8 2014
Firstpage :
758
Lastpage :
759
Abstract :
A Ka-band dual-gate frequency doubler using 0.5 μm GaAs enhancement-mode pHEMT process is presented. The cascode circuit is equalised to the dual-gate frequency doubler and the relationship between bias and output matching is discussed to obtain the maximum output power and conversion efficiency. Since a pinch-off gate-to-source bias is driven at the input gate node, the frequency doubler consumes little DC power when injecting a low-power fundamental signal. Based on the analysis, the designed dual-gate doubler has a 3 dB bandwidth of 5.6 GHz, from 36 to 41.6 GHz. The fundamental suppressions are better than 15 dB. The measured maximum conversion gain is -0.9 dB at an injected power of 7 dBm. A high saturation output power is 7 dBm with a conversion efficiency of 14.3%. The measured results confirm the validity of the proposed analysis method.
Keywords :
III-V semiconductors; frequency multipliers; gallium arsenide; high electron mobility transistors; millimetre wave field effect transistors; millimetre wave frequency convertors; DC power; E-mode pHEMT process; GaAs; Ka-band dual-gate frequency doubler; bandwidth 5.6 GHz; cascode circuit; efficiency 14.3 percent; enhancement-mode pHEMT process; frequency 20 GHz to 41.6 GHz; input gate node; low-power fundamental signal; pinch-off gate-to-source bias; size 0.5 mum;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el.2014.0654
Filename :
6824056
Link To Document :
بازگشت