DocumentCode
3029272
Title
Deposition temperature dependent properties of MOCVD grown polycrystalline CuGaSe2 thin films and solar cells
Author
Fiedeler, U. ; Bauknecht, A. ; Gerhard, A. ; Albert, J. ; Lux-Steiner, M.Ch. ; Siebentritt, S.
Author_Institution
Hahn-Meitner-Inst., Berlin, Germany
fYear
2000
fDate
2000
Firstpage
626
Lastpage
629
Abstract
Metal organic vapour deposition (MOCVD) was employed to deposit polycrystalline CuGaSe2 films and solar cells on glass. Deposition temperature was varied between 570°C and 450°C. Continuous CuGaSe2 films were obtained at a deposition temperature of 450°C. Even at this low deposition temperatures the photoluminescence (PL) of the films is dominated by near band gap emission. Depending on the composition the PL spectra are dominated by different donor acceptor pair transitions. Solar cells are processed from these 400 nm thick films and the compositional dependence of the photovoltaic parameters is discussed, especially the increase of the open circuit voltage up to 821 mV under 100 mW/cm2 AM1.5 with increasing Ga content
Keywords
MOCVD; MOCVD coatings; copper compounds; energy gap; gallium compounds; photoluminescence; semiconductor device measurement; semiconductor device testing; semiconductor thin films; solar cells; 400 nm; 570 to 450 C; 821 mV; CuGaSe2; MOCVD growth; deposition temperature dependent properties; polycrystalline CuGaSe2 solar cells; polycrystalline CuGaSe2 thin films; Chemical vapor deposition; Glass; MOCVD; Photoluminescence; Photonic band gap; Photovoltaic cells; Photovoltaic systems; Solar power generation; Temperature dependence; Thick films;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference, 2000. Conference Record of the Twenty-Eighth IEEE
Conference_Location
Anchorage, AK
ISSN
0160-8371
Print_ISBN
0-7803-5772-8
Type
conf
DOI
10.1109/PVSC.2000.915921
Filename
915921
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