Title :
Microcrystalline silicon-germanium as a low-gap material for solar cells
Author :
Isomura, M. ; Shima, M. ; Taira, S. ; Wakisaka, K. ; Okamoto, S. ; Kiyama, S.
Author_Institution :
New Mater. Res. Centre, Sanyo Electr. Co. Ltd., Osaka, Japan
Abstract :
Microcrystalline silicon-germanium (μc-SiGe) is investigated as a low-gap material for stacked solar cells. μc-SiGe films were prepared by PECVD (13.56 MHz) from a SiH4, GeH4 and H2 mixture. The optical absorption coefficient becomes 10 times larger than that for microcrystalline silicon (μc-Si) by increasing the Ge content to 50 at.%. μc-SiGe solar cells are demonstrated with 30% Ge content and 5000 Å thickness, and a conversion efficiency of 4.3% (the highest value in μc-SiGe solar cells so far) and short-circuit current density (Isc) of 28 mA/cm2 are achieved. A 20% of collection efficiency is observed at 1000 nm. This Isc value is larger than that of the best μc-Si solar cells with 2 μm thickness. It is suggested that the μc-SiGe provides much thinner microcrystalline solar cells with higher efficiency by utilizing longer wavelength light
Keywords :
Ge-Si alloys; absorption coefficients; plasma CVD coatings; semiconductor materials; short-circuit currents; solar cells; μc-SiGe films; 13.56 MHz; Ge content; GeH4; H2; PECVD; SiGe; SiH4; collection efficiency; conversion efficiency; low-gap material; microcrystalline silicon-germanium; microcrystalline solar cells; optical absorption coefficient; short-circuit current density; solar cells; stacked solar cells; Crystallization; Germanium silicon alloys; Hydrogen; Optical films; Photovoltaic cells; Raman scattering; Silicon germanium; Spectroscopy; Substrates; Temperature;
Conference_Titel :
Photovoltaic Specialists Conference, 2000. Conference Record of the Twenty-Eighth IEEE
Conference_Location :
Anchorage, AK
Print_ISBN :
0-7803-5772-8
DOI :
10.1109/PVSC.2000.915998