Title :
Characterization of self-formed Ti-based barrier layers in Cu(Ti)/dielectric-layer samples using X-ray Photoelectron Spectroscopy
Author :
Kohama, Kazuyuki ; Ito, Kazuhiro ; Sonobayashi, Yutaka ; Mori, Kenichi ; Maekawa, Kazuyoshi ; Shirai, Yasuharu ; Murakami, Masanori
Author_Institution :
Dept. of Mater. Sci. & Eng., Kyoto Univ., Kyoto, Japan
Abstract :
In this paper, the amorphous phases in the Ti-based barrier layers are identified. More so, X-ray photoelectron spectroscopy (XPS) technique is employed to study its composition.
Keywords :
X-ray photoelectron spectra; amorphous state; copper alloys; diffusion barriers; low-k dielectric thin films; nanostructured materials; self-assembly; titanium alloys; CuTi-SiCN; CuTi-SiO2; X-ray photoelectron spectroscopy; XPS; amorphous phase; dielectric-layer samples; self-formed barrier layers; Amorphous materials; Annealing; Crystallization; Dielectric constant; Dielectric measurements; Electrochemical impedance spectroscopy; Electronic mail; Materials science and technology; Phase estimation; Tin;
Conference_Titel :
Interconnect Technology Conference (IITC), 2010 International
Conference_Location :
Burlingame, CA
Print_ISBN :
978-1-4244-7676-3
DOI :
10.1109/IITC.2010.5510318
