DocumentCode :
3032647
Title :
On the modeling and testing of gate oxide shorts in CMOS logic gates
Author :
Hao, Hong ; McCluskey, Edward J.
Author_Institution :
Center for Reliable Comput., Stanford Univ., CA, USA
fYear :
1991
fDate :
18-20 Nov 1991
Firstpage :
161
Lastpage :
174
Abstract :
The electrical and logic operation of CMOS simple logic gates in the presence of gate oxide shorts is analyzed using realistic defect models. These models reflect the resistive nature of gate oxide shorts and the difference between n- and p-channel transistors. The resistance of a short plays a central role in determining the actual circuit behavior. Faults caused by gate oxide shorts can be dependent not only on inputs to the gate containing the fault but also on other signals in the circuit, and can escape tests generated using normal TPG schemes. The stuck-at test set for a logic gate cannot guarantee to detect all transistor gate-to-source and gate-to-drain shorts in the logic gate. Gate oxide shorts in n-channel transistors affect circuit operation more severely than those in p-channel transistors do. Some limitations of present transistor-level fault modeling techniques are revealed
Keywords :
CMOS integrated circuits; insulated gate field effect transistors; integrated logic circuits; modelling; semiconductor device models; CMOS logic gates; circuit behavior; defect models; gate oxide shorts; limitations; logic operation; modeling; n-channel transistors; p-channel transistors; testing; transistor-level fault modeling; CMOS logic circuits; CMOS process; Circuit faults; Circuit testing; Logic circuits; Logic gates; Logic testing; Semiconductor device modeling; Switches; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Defect and Fault Tolerance on VLSI Systems, 1991. Proceedings., 1991 International Workshop on
Conference_Location :
Hidden Valley, PA
ISSN :
1550-5774
Print_ISBN :
0-8186-2457-4
Type :
conf
DOI :
10.1109/DFTVS.1991.199958
Filename :
199958
Link To Document :
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