DocumentCode :
3033250
Title :
Manufacturing technology challenges for low power electronics
Author :
Lemnios, Z.J.
Author_Institution :
Adv. Res. Projects Agency, Arlington, VA, USA
fYear :
1995
fDate :
6-8 June 1995
Firstpage :
5
Lastpage :
8
Abstract :
SOI is an attractive technology option for low power, high performance semiconductors. A number of breakthroughs and developments are required to move the material into mainstream acceptance by manufacturers. It is too early to predict the future dominance of SOI technology. Next steps in the development of an SOI technology base are better understanding of how materials issues affect device/circuit operation, and which device design paradigms are best.
Keywords :
VLSI; integrated circuit design; integrated circuit technology; integrated circuit yield; silicon-on-insulator; IC technology; SOI; device design paradigms; device/circuit operation; low power electronics; mainstream acceptance; Batteries; CMOS technology; Electronics cooling; Electronics packaging; Low power electronics; Manufacturing; Microprocessors; Power dissipation; Silicon on insulator technology; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology, 1995. Digest of Technical Papers. 1995 Symposium on
Conference_Location :
Kyoto, Japan
Print_ISBN :
0-7803-2602-4
Type :
conf
DOI :
10.1109/VLSIT.1995.520833
Filename :
520833
Link To Document :
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