DocumentCode :
3033500
Title :
Spatial, LET and range dependence of enhanced charge collection by single ion strike in 4H-SiC MESFETs
Author :
Onoda, S. ; Makino, T. ; Ono, S. ; Katakami, S. ; Arai, M. ; Ohshima, T.
Author_Institution :
Japan Atomic Energy Agency (JAEA), Takasaki, Japan
fYear :
2011
fDate :
19-23 Sept. 2011
Firstpage :
36
Lastpage :
41
Abstract :
The spatial dependence of transient currents induced in recessed 4H-SiC MESFETs by various ions with the same Linear Energy Transfer (LET) but different projected ranges is evaluated. The most largest signal is observed when ion strikes the Gate-to-Drain Recess (GDR). In addition, the signals are detected when an ion strikes the Gate-to-Source Recess (GSR), gate and drain. The charge enhancement mechanism is clarified by using numerical simulation. Finally we discuss the effect of ion energy, LET and projected range on the charge enhancement effect. It is found that the early stage of charge collection is insensitive to projected range, energy and diameter of ion track, however, depends on LET. The duration of charge collection is independent of projected range and LET, however, depends on energy.
Keywords :
Schottky gate field effect transistors; radiation hardening (electronics); silicon compounds; wide band gap semiconductors; 4H-SiC MESFET; GDR; GSR; LET; SiC; charge collection enhancement effect mechanism; gate-to-drain recess; gate-to-source recess; linear energy transfer; numerical simulation; signal detection; single ion energy strike; transient current spatial dependence; Buffer layers; Charge carrier processes; Electrodes; Logic gates; MESFETs; Modulation; Transient analysis; 4H-SiC MESFET; Single ion strike; bipolar effect; channel modulation effect;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Radiation and Its Effects on Components and Systems (RADECS), 2011 12th European Conference on
Conference_Location :
Sevilla
ISSN :
0379-6566
Print_ISBN :
978-1-4577-0585-4
Type :
conf
DOI :
10.1109/RADECS.2011.6131381
Filename :
6131381
Link To Document :
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