Title :
Effects of process-induced mechanical stress on ESD performance
Author :
Kubota, K. ; Okuyama, K. ; Miura, H. ; Kawashima, Y. ; Ishizuka, H. ; Hashimoto, C.
Author_Institution :
Semicond. & Integrated Circuits Div., Hitachi Ltd., Tokyo, Japan
Abstract :
We studied the generation of dislocations during an ESD event by electrothermal and mechanical stress simulations based on analysis of critical mechanical stress for defect formation. We found the local thermal stress by ESD generates dislocations cooperatively with the residual mechanical stress in the Si substrate due to field oxidation. This means that process-induced mechanical stress is another key factor for controlling ESD performance, which will be important especially in low-power applications with severe leak requirements.
Keywords :
VLSI; dislocations; electrostatic discharge; elemental semiconductors; integrated circuit reliability; integrated circuit technology; internal stresses; oxidation; silicon; thermal stresses; ESD performance; IC reliability; Si; VLSI process; defect formation; dislocation generation; electrothermal stress simulations; field oxidation; local thermal stress; low-power applications; process-induced mechanical stress; severe leak requirements; Compressive stress; Degradation; Electrostatic discharge; Electrothermal effects; Oxidation; Protection; Substrates; Testing; Thermal stresses; Voltage;
Conference_Titel :
VLSI Technology, 1995. Digest of Technical Papers. 1995 Symposium on
Conference_Location :
Kyoto, Japan
Print_ISBN :
0-7803-2602-4
DOI :
10.1109/VLSIT.1995.520871