• DocumentCode
    3035266
  • Title

    Effects of process-induced mechanical stress on ESD performance

  • Author

    Kubota, K. ; Okuyama, K. ; Miura, H. ; Kawashima, Y. ; Ishizuka, H. ; Hashimoto, C.

  • Author_Institution
    Semicond. & Integrated Circuits Div., Hitachi Ltd., Tokyo, Japan
  • fYear
    1995
  • fDate
    6-8 June 1995
  • Firstpage
    87
  • Lastpage
    88
  • Abstract
    We studied the generation of dislocations during an ESD event by electrothermal and mechanical stress simulations based on analysis of critical mechanical stress for defect formation. We found the local thermal stress by ESD generates dislocations cooperatively with the residual mechanical stress in the Si substrate due to field oxidation. This means that process-induced mechanical stress is another key factor for controlling ESD performance, which will be important especially in low-power applications with severe leak requirements.
  • Keywords
    VLSI; dislocations; electrostatic discharge; elemental semiconductors; integrated circuit reliability; integrated circuit technology; internal stresses; oxidation; silicon; thermal stresses; ESD performance; IC reliability; Si; VLSI process; defect formation; dislocation generation; electrothermal stress simulations; field oxidation; local thermal stress; low-power applications; process-induced mechanical stress; severe leak requirements; Compressive stress; Degradation; Electrostatic discharge; Electrothermal effects; Oxidation; Protection; Substrates; Testing; Thermal stresses; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Technology, 1995. Digest of Technical Papers. 1995 Symposium on
  • Conference_Location
    Kyoto, Japan
  • Print_ISBN
    0-7803-2602-4
  • Type

    conf

  • DOI
    10.1109/VLSIT.1995.520871
  • Filename
    520871