DocumentCode
3035266
Title
Effects of process-induced mechanical stress on ESD performance
Author
Kubota, K. ; Okuyama, K. ; Miura, H. ; Kawashima, Y. ; Ishizuka, H. ; Hashimoto, C.
Author_Institution
Semicond. & Integrated Circuits Div., Hitachi Ltd., Tokyo, Japan
fYear
1995
fDate
6-8 June 1995
Firstpage
87
Lastpage
88
Abstract
We studied the generation of dislocations during an ESD event by electrothermal and mechanical stress simulations based on analysis of critical mechanical stress for defect formation. We found the local thermal stress by ESD generates dislocations cooperatively with the residual mechanical stress in the Si substrate due to field oxidation. This means that process-induced mechanical stress is another key factor for controlling ESD performance, which will be important especially in low-power applications with severe leak requirements.
Keywords
VLSI; dislocations; electrostatic discharge; elemental semiconductors; integrated circuit reliability; integrated circuit technology; internal stresses; oxidation; silicon; thermal stresses; ESD performance; IC reliability; Si; VLSI process; defect formation; dislocation generation; electrothermal stress simulations; field oxidation; local thermal stress; low-power applications; process-induced mechanical stress; severe leak requirements; Compressive stress; Degradation; Electrostatic discharge; Electrothermal effects; Oxidation; Protection; Substrates; Testing; Thermal stresses; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, 1995. Digest of Technical Papers. 1995 Symposium on
Conference_Location
Kyoto, Japan
Print_ISBN
0-7803-2602-4
Type
conf
DOI
10.1109/VLSIT.1995.520871
Filename
520871
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